奈米微影科技導論
Introduction to Nanolithography
| 節 | 週四 |
|---|---|
2 09:00–09:50 | 奈米微影科技導論 CM217 3 節連堂 |
3 10:10–11:00 | |
4 11:10–12:00 |
* 根據陽明交大上課時間表所列
The objective of this course is to let students learn the fundamental knowledge of nano-lithography. There will be materials for students to understand the current trend and know-how of the advanced optical lithography equipment or materials. In this course, we will describe the things that drive the limits of optical lithography and study optical imaging from the perspective of diffraction, and the advanced development of the new lithography technology. The goal is to develop a fundamental understanding of concepts of diffraction, Fourier spectral analysis, coherency theory, lens interaction, aberration concepts, image enhancement, and automatic micro-imaging measurement.
Optics, electromagnetics, Semiconductor Device
midterm 30%, homework 30%, final 40% (group presentation 20% and final report 20%)
| 週次 | 主題 |
|---|---|
| 第 1 週 | Syllabus introduction and introduction, semiconductor industry overview |
| 第 2 週 | Introduction to optical lithography |
| 第 3 週 | Electromagnetic radiation Plane waves, Intensity |
| 第 4 週 | Diffraction and Fourier transform Aerial image formation |
| 第 5 週 | Partial coherence Aberrations |
| 第 6 週 | Flare and defocus |
| 第 7 週 | Vector imaging, image metrics Standing waves |
| 第 8 週 | Swing curves Top and bottom ARCs |
| 第 9 週 | Midterm |
| 第 10 週 | Chemistry of photoresisit Materials. |
| 第 11 週 | RET – Optical proximity correction |
| 第 12 週 | Focus exposure, process window, DOF, MEEF |
| 第 13 週 | Advanced lithography I: X-ray lithography, LIGA, interference lithography. |
| 第 14 週 | Advanced lithography II: E-beam lithography |
| 第 15 週 | Metrology system |
| 第 16 週 | Oral presentation (I) |
| 第 17 週 | Oral presentation (II) |
| 第 18 週 | Final |
Microlithography: Science and Technology, Third Edition CRC Press, 2013 Kazuaki Suzuki, Bruce Smith