校際選修

115-1 選課時程

進行中

  • 初選第一階段 6/15/2026
  • 初選第二階段 6/22/2026
  • 校際選修 8/24/2026
  • 初選第三階段 8/31/2026
  • 開學後加退選 9/7/2026
  • 逾期加退選 9/21/2026
選課資源

低溫電漿原理與應用

Fundamentals and Applications of Low-temperature Plasmas

學期
108-2
學分
3 學分
當期課號
5295
永久課號
IME5450
開課單位
機械工程學系
授課教師
吳宗信
校區
光復
類別
選修
上課時間表
週一
A
18:30–19:20
低溫電漿原理與應用
EE130
3 節連堂
B
19:30–20:20
C
20:30–21:20

* 根據陽明交大上課時間表所列

概述

1. Introduce the fundamental electromagnetics for students with mechanical engineering background. 2. Introduce the operational principles of plasma physics in various kinds of plasma chamber in semiconductor materials processing. 3. Introduce the developments in simulation and experimental techniques for plasma flows in materials processing. 4. Hands-on measurements using Langmuir probe for typical low-temperature plasmas. 5. Hands-on simulations using fluid modeling and PIC-MCC methods for typical DC & RF gas discharge.

先修科目

Fluid Mechanics, Eng. Math.

評分方式

1. Homework: 40% (n times) 2. Midterm exam: 30% 3. Final Project Report: 30% (1D PIC code developed by the students)

課程大綱
  • Introduction to Plasma
  • Single Charged Particle Motion
  • Fundamentals of Plasma Equations and Equilibrium
  • Atomic Collisions (Molecular Collision: optional)
  • Plasma Dynamics in Weakly Ionized Plasma
  • Diffusion and Transport of Plasma
  • DC Sheaths
  • Particle and Energy Balance in Discharges
  • Capacitively Discharges
  • Inductively Discharges
  • Wave-Heated Discharges
  • Plasma Processing and Related Topics
教科書

************ Course notes will be distributed during classes ***************** 1. Principles of Plasma Discharge and Materials Processing by M.A. Lieberman and A.J. Lichtenberg, John Wiley & Sons, Inc, 1994. 2. Introduction to Plasma Theory by D.R. Nicholson, Krieger Publishing Company, Florida, 1991. 3. Plasma Physics Via Computer Simulation by C.K. Birdsall and A.B. Langdon, McGraw-Hill Book Company, 1985. 4. Non-Equilibrium Air Plasmas at Atmospheric Pressure by K.H. Becker, U. Kogelschatz, K.H. Schoenbach and R.J. Barker, Taylor & Francis, 2004.