校際選修

115-1 選課時程

進行中

  • 初選第一階段 6/15/2026
  • 初選第二階段 6/22/2026
  • 校際選修 8/24/2026
  • 初選第三階段 8/31/2026
  • 開學後加退選 9/7/2026
  • 逾期加退選 9/21/2026
選課資源

奈米微影科技導論

Introduction to Nanolithography

學期
109-2
學分
3 學分
當期課號
5155
永久課號
IIB5124
開課單位
影像與生醫光電研究所
授課教師
陳國平
校區
歸仁
類別
選修
上課時間表
週二
5
13:20–14:10
奈米微影科技導論
CM216
3 節連堂
6
14:20–15:10
7
15:30–16:20

* 根據陽明交大上課時間表所列

概述

更新: 本課程提供跨校區遠距教室授課, 交大台南校區奇美樓216 / 交大光復校區工程四館B06 /陽明校區:圖資大樓404 The objective of this course is to let students learn the fundamental knowledge of onano-lithography. There will be materials for students to understand the current trend and know-how of the advanced optical lithography equipment or materials. In this course, we will describe the things that drive the limits of optical lithography and study optical imaging from the perspective of diffraction, and the advanced development of the new lithography technology. The goal is to develop a fundamental understanding of concepts of diffraction, Fourier spectral analysis, coherency theory, lens interaction, aberration concepts, image enhancement, and automatic micro-imaging measurement.

先修科目

Optics, electromagnetics

教學方式

1. 本課程提供跨校區遠距教室授課, 交大台南校區奇美樓216 / 交大光復校區工程四館B06 /陽明校區:圖資大樓404 2. 授課教師會輪流在各校區授課並提供同步遠距視訊. 3. 期末評量以口頭與書面報告為主並會邀請業界講師進行演講.

評分方式

midterm 30%, homework 30%, final 40% (group presentation 20% and final report 20%)

週次計畫
週次主題
第 1 週Syllabus introduction and introduction, semiconductor industry overview
第 2 週Introduction to optical lithography
第 3 週Electromagnetic radiation Plane waves, Intensity
第 4 週Diffraction and Fourier transform Aerial image formation
第 5 週Partial coherence Aberrations
第 6 週Flare and defocus
第 7 週Vector imaging, image metrics Standing waves
第 8 週Swing curves Top and bottom ARCs
第 9 週Midterm
第 10 週Chemistry of photoresisit Materials.
第 11 週RET – Optical proximity correction
第 12 週Focus exposure, process window, DOF, MEEF
第 13 週Advanced lithography I: X-ray lithography, LIGA, interference lithography.
第 14 週Advanced lithography II: E-beam lithography
第 15 週Metrology system
第 16 週Oral presentation
教科書

Microlithography: Science and Technology, Third Edition CRC Press, 2013 Kazuaki Suzuki, Bruce Smith

Office Hours
地點
台南校區奇美樓517 或視訊方式
時間
星期二上午11:00-noon
聯絡方式
57824 or skype: kobela031