奈米微影科技導論

Introduction to Nanolithography

學期

110-2

學分

3 學分

當期課號

5152

永久課號

IIB5124

開課單位

影像與生醫光電研究所

授課教師

陳國平

校區

歸仁

類別

選修

上課時間表

節	週二
5 13:20–14:10	奈米微影科技導論 CM216 3 節連堂
6 14:20–15:10
7 15:30–16:20

* 根據陽明交大上課時間表所列

概述

The objective of this course is to let students learn the fundamental knowledge of onano-lithography. There will be materials for students to understand the current trend and know-how of the advanced optical lithography equipment or materials. In this course, we will describe the things that drive the limits of optical lithography and study optical imaging from the perspective of diffraction, and the advanced development of the new lithography technology. The goal is to develop a fundamental understanding of concepts of diffraction, Fourier spectral analysis, coherency theory, lens interaction, aberration concepts, image enhancement, and automatic micro-imaging measurement.

先修科目

Optics, electromagnetics

教學方式

1. 作業; 期中考; 期末評量以口頭與書面報告為主 2. 課程錄影 on youtube 2022/02/22_Week 02: https://youtu.be/f3Vz27xUqVAthanks.KP 2022/03/01_Week 03: https://youtu.be/G9DSFqK9mL8 2022/03/08_Week 04: https://youtu.be/fTLOcATn06k 2022/03/15_Week 05: https://youtu.be/JNh0ZB8N3X0 2022/03/22_Week 06: https://youtu.be/BpEUoul5SRg 2022/03/29_Week 07: https://youtu.be/Pwe42lT7J_U 2022/04/05_Week 08: Spring Break 2022/04/12_Week 09: https://youtu.be/8QKK68NUyVw 2022/04/19_Week 10: https://youtu.be/tRwKsPSvnko 2022/04/26_Week 11: 期中考 2022/05/03_Week 12: Part I: https://youtu.be/_jCG3__l0xk, Part II: https://youtu.be/0aulaBVXvXw 2022/05/10_Week 13: https://youtu.be/tg8CcuFpep4 2022/05/17_Week 14: https://youtu.be/jRcjXkdjKB8 2022/05/24_Week 15: https://youtu.be/6xINqbADwBQ

評分方式

midterm 30%, homework 20%, final 50% (group presentation 30% and final report 20%)

週次計畫

週次	主題
第 1 週	Syllabus introduction and introduction, semiconductor industry overview
第 2 週	Introduction to optical lithography
第 3 週	Electromagnetic radiation Plane waves, Intensity
第 4 週	Diffraction and Fourier transform Aerial image formation
第 5 週	Partial coherence Aberrations
第 6 週	Flare and defocus
第 7 週	Vector imaging, image metrics Standing waves
第 8 週	Swing curves Top and bottom ARCs
第 9 週	Midterm
第 10 週	Chemistry of photoresisit Materials.
第 11 週	RET – Optical proximity correction
第 12 週	Focus exposure, process window, DOF, MEEF
第 13 週	Advanced lithography I: X-ray lithography, LIGA, interference lithography.
第 14 週	Advanced lithography II: E-beam lithography
第 15 週	Metrology system
第 16 週	Oral presentation

教科書

Microlithography: Science and Technology, Third Edition CRC Press, 2013 Kazuaki Suzuki, Bruce Smith

Office Hours

地點: 台南校區奇美樓517 或視訊方式
時間: 星期二下午4:30-5:30
聯絡方式: 57824 or skype: kobela031