電漿科學與工程
Plasma Science and Engineering
| 節 | 週三 |
|---|---|
7 15:30–16:20 | 電漿科學與工程 ED203 3 節連堂 |
8 16:30–17:20 | |
9 17:30–18:20 |
* 根據陽明交大上課時間表所列
Nanofabrication of advanced devices such as ULSIs, nanomachines, high-power, high-frequency, and optical devices, and bio chips are realized by means of reactive plasmas, reactive particle beams and so on, via interaction between the device material and microscopic particles such as atoms, molecules, ions, radicals, and photons. This lecture will introduce behavior and interaction of such microscopic particles in plasma processes such as reactive plasma, beam, and atom/molecule handling which are basis of advanced technologies. Measurement methods of such interactions will be explained. Examples of advanced devices and nano-processes used in these devices advanced industries will be introduced.
普物
Lectures will be given by using PPTX Projections
Attendance - 32% Homework - 20% Mid-term report - 24% Final - 24%
| 週次 | 主題 |
|---|---|
| 第 1 週 | Course Overview (1 lecture) |
| 第 2 週 | Course Overview (1) |
| 第 3 週 | High Density and Low Pressure Plasma (2) |
| 第 4 週 | High Density and Low Pressure Plasma (2) |
| 第 5 週 | Plasma Etching (2) |
| 第 6 週 | Plasma Etching (2) |
| 第 7 週 | Plasma Chemical Vapor Deposition and Surface Modification (2) |
| 第 8 週 | Plasma Chemical Vapor Deposition and Surface Modification (2) |
| 第 9 週 | Midterm Report |
| 第 10 週 | Pulsed Plasma Processes (2) |
| 第 11 週 | Pulsed Plasma Processes (2) |
| 第 12 週 | Neutral Beam Atomic Layer Processes (2) |
| 第 13 週 | Neutral Beam Atomic Layer Processes (2) |
| 第 14 週 | Green nanotechnology created by plasma process (2) |
| 第 15 週 | Green nanotechnology created by plasma process (2) |
| 第 16 週 | Final Test |
Selected Papers and Lecture Notes will be Available
- 時間
- 每週三下午1:20-3:20
- 聯絡方式
- 電話或Email: seiji.samukawa.e2@nycu.edu.tw