美國專利法
U.S. Patent Law
| 節 | 週五 |
|---|---|
5 13:20–14:10 | 美國專利法 MB1069 3 節連堂 |
6 14:20–15:10 | |
7 15:30–16:20 |
* 根據陽明交大上課時間表所列
美國專利法對於我國科技產業影響重大,在專利訴訟上亦是全球最重要的戰場,為提升學生畢業後就業的競爭力,並增加台灣科技產業的專利實力,本課程將介紹美國專利法各個重要環節,輔以科學園區實務經驗,訓練學生日後成為高品質專利的發明人、專利代理人或專利律師,並善用 LegalTech 相關工具提高生產力。另,針對 AI 及軟體相關專利將適時特別探討。 U.S. patent law has a significant impact on the high-tech industry in Taiwan and is also the most important battleground for patent litigation globally. To enhance students' competitiveness in the job market after graduation and to increase the patent strength of Taiwan's high-tech industry, this course will introduce various important cases and aspects of U.S. patent law. It will be supplemented with recent news and practical experiences. The goal of this course is to equip students with knowledge in patent law, preparing them for future roles as inventors, patent agents, or patent lawyers. The curriculum will include an introduction to LegalTech tools, aimed at enhancing productivity. In addition, there will be discussions on patents related to AI and software.
本課程為實務導向,主要適合兩種類型學生: (1) 具理工背景,日後有興趣成為美國專利之發明人、專利代理人或專利律師,(2) 具法律背景,日後有興趣從事專利相關工作。其次,亦適合具程式設計能力日後有興趣往 LegalTech 發展者。學生如已修習過智慧財產權法概論、台灣專利法等相關課程者佳,但並不強制要求先修相關課程。外語能力:本課程多數資料為英文,學生須具備對英文資料的良好閱讀能力,授課時以中文進行。 This course is based on cases and primarily suitable for two types of students: (1) those with a background in science and engineering who are interested in becoming inventors, patent agents, or patent lawyers in the United States, and (2) those with a legal background interested in pursuing patent-related work. Additionally, it is also suitable for those with programming skills interested in developing LegalTech. It is preferable for students to have taken courses related to intellectual property law, such as an introduction to intellectual property rights law or Taiwan patent law, but it is not mandatory. Language skills: Most materials in this course are in English, so students should have good reading comprehension of English materials. The teaching in class will be in Chinese.
=== 本課程第二週起採 錄製課程自習 90 mins + 實體教室課程 90 mins (13:20~14:50) 進行 === * 教材編選:以教科書、案例、專利實務相關資料為主,由教師選編。 * 教學方法:以講課、問題討論為主,學生應進行課前閱讀。 * 課程相關事項將透過E3教學平台適時發布。 === From the second week, the course format is planned as: 90 minutes of recorded self-study lessons + 90 minutes of in-person classroom sessions (13:20-14:50) === * Teaching Materials Selection: The content will primarily consist of textbooks, case studies, and materials related to patent practice, selected by the instructor. * Teaching Method: The course will mainly involve lectures and discussions. Students are expected to complete reading assignments before class. * Course-related information will be timely posted on the E3 platform.
1. 期中個人上台報告 15% 2. 課堂出席、參與討論 10% 3. 期末小組上台報告 40% 4. 期末個人書面報告 35% 1. Mid-term individual presentation 15% 2. Classroom attendance and participation in discussions 10% 3. End-of-semester group presentation 40% 4. End-of-semester individual written report 35%
| 週次 | 主題 |
|---|---|
| 第 1 週 | * 美國專利法課程介紹 * 隨堂介紹: (1) 產業動態,(2) LegalTech for Patents |
| 第 2 週 | * (Ch 1) The Patent and its Claims |
| 第 3 週 | * (Ch 0) Introduction |
| 第 4 週 | * (Ch 2) Subject Matter Eligibility |
| 第 5 週 | * (Ch 3) Utility |
| 第 6 週 | * (Ch 4) Disclosure |
| 第 7 週 | 連假放假 |
| 第 8 週 | * 10:00 前向助教登記期中個人上台報告題目 * (Ch 4) Disclosure |
| 第 9 週 | * 13:20 前繳交期中上台簡報 * (Ch 5) Anticipation (I) |
| 第 10 週 | * 期中個人上台報告 * 錄影自習內容 * (無期中考) |
| 第 11 週 | * (Ch 5) Anticipation (II) * (Ch 6) Obviousness (I) |
| 第 12 週 | 13:20 前向助教登記期末分組及上台報告題目 * (Ch 6) Obviousness (II) |
| 第 13 週 | * (Ch 7) Infringement (I) |
| 第 14 週 | * (Ch 7) Infringement (II) |
| 第 15 週 | * 13:20 前繳交期末上台簡報 * (Ch 8) Defenses to Infringement |
| 第 16 週 | * 小組期末報告 * (無期末考) |
| 第 17 週 | * 13:20 前繳交期末個人書面報告 * 自主學習 (不上課) : Deep Learning for Patents (演講錄影) |
| 第 18 週 |
(1) Patent Law: An Open-Source Casebook (Fall 2023), by Janis, Mark D. and Sichelman, Ted M. and Allison, John R. and Cotter, Thomas F. and Cotropia, Christopher Anthony and Karshtedt, Dmitry and Lefstin, Jeffrey A. and Rantanen, Jason and Taylor, David O. and Tu, Shine (Sean), available at SSRN: https://ssrn.com/abstract=3840631. (2) (reference) Patent Law: An Open-Access Casebook (v.1.1) (July 2, 2022), by Burstein, Sarah and Rajec, Sarah R.W. and Sawicki, Andres, available at https://patentlawcasebook.com/
- 地點
- 授課教室
- 時間
- 每周課程結束後
- 聯絡方式
- jasonlee@nycu.edu.tw