電漿基礎介紹與應用
Introduction to Plasma and its Applications
| 節 | 週三 |
|---|---|
A 18:30–19:20 | 電漿基礎介紹與應用 EE230 3 節連堂 |
B 19:30–20:20 | |
C 20:30–21:20 |
* 根據陽明交大上課時間表所列
This course is to provide the fundamental knowledge of plasma, particularly low-temperature plasma, and to introduce its applications in engineering. Students are supposed to benefit from this course with plasma physics, plasma chemistry and plasma potential in various applications, such as semiconductor manufacturing, material processing, flow control and biomedical science.
Fluid Mechanics, Engineering Mathematics
TAs will be assigned and can be contacted by phone (#55176) or by lab visit (EE320).
Homework: 40% Midterm: 25% Quiz: 5% Final report: 30% # No adjustment if the final grade is below 68.
- Plasma Physics
- Plasma Chemistry
- Plasma Classifications
- Plasma Applications
- Introduction
| 週次 | 主題 |
|---|---|
| 第 1 週 | Introduction |
| 第 2 週 | Plasma Fundamentals and Production |
| 第 3 週 | Plasma Physics |
| 第 4 週 | Plasma Physics |
| 第 5 週 | Plasma Physics |
| 第 6 週 | Plasma Physics |
| 第 7 週 | Holiday (no class) |
| 第 8 週 | Plasma Chemistry |
| 第 9 週 | Midterm |
| 第 10 週 | Plasma Classifications |
| 第 11 週 | Plasma Classifications |
| 第 12 週 | Plasma Applications |
| 第 13 週 | Plasma Applications |
| 第 14 週 | Plasma Applications |
| 第 15 週 | Final Report |
| 第 16 週 | Final Report |
Course will be taught based on lecture notes while students are encourage to read the reference listed below: 1. Introduction to Plasma Physics and Controlled Fusion”, by Francis F. Chen, Springer, 2016. 2. Principles of Plasma Discharge and Materials Processing by M.A. Lieberman and A.J. Lichtenberg, John Wiley & Sons, Inc, 1994. 3. MIT Open Course: Introduction to Plasma Physics I References 1 & 2 are available in e-book through the University Library.
- 地點
- EE473
- 時間
- By appointment
- 聯絡方式
- 03-5712121ext.55119